8th Global plasma forum,
"Leading edge of semiconductor process technology"

主催：名古屋大学・低温プラズマ科学研究センター（cLPS)
後援：名古屋大学協力会

Center for Low-temperature plasma sciences (cLPS), Nagoya University will hold the following international forum. Considering the recent situation of the new Coronavirus, this event will be held in the Webinar format. We will send you the Zoom URL after registering on the web.

We look forward to your participation.

Date, time, and place:
1st Feb., Tuesday, 2022, 14：45〜18：00
Online (Zoom)

【8th Global plasma forum】
14：45〜15：15　Prof. Fumihiro Inoue, Yokohama National University,
"Research trends in 3D semiconductor interconnect technology"

15：15〜15：45　Dr. Mitsuhiro Oomura, KIOXIA Corporation,
"Challenges in high-aspect-ratio etching process for 3D flash memory ~Striation formation mechanism~"

15：45〜16：15　Prof. Bibhuti Bhusan Sahu, Indian Institute of Technology (IIT) Delhi,
"Study of electron behavior using laser photodetachment and dual-frequency compensated Langmuir probe in pulsed plasma etching processes"



16：30〜17：00　Dr. Hakaru Mizoguchi, Hiroaki Nakarai, Kouji Kakizaki (Gigaphoton), Hiroshi Ikenoue, Masaharu Shiratani (Kyushu Univ.),
"Progress of DUV・EUV Light Source and its Extension to Leading Edge Semiconductor Manufacturing", Video lecture

17：00〜17：30　Mr. Tim Tanaka, SCREEN Semiconductor Solutions Co., Ltd.,
"Basic and advanced wet cleaning process for semiconductor manufacturing", TBC

Scope
This international forum will provide a forum for presenting the latest research results on a wide range of topics related to the field of low temperature plasma sciences, from semiconductor processes to nanomaterial synthesis, surface functionalization, medical / biotechnology, and environmental applications, as well as exploring new interdisciplinary fields. And the purpose of this forum is to get the beginning of the construction of new international cooperation. In particular, we will provide a venue for presentations mainly to young researchers and graduate students and promote global human resource development and the construction of next-generation communities.
This time, the 8th forum will focus on the manufacturing process of semiconductor devices, which are the core of low-temperature plasma applications and are attracting social attention due to the recent semiconductor shortage problem. Co-sponsored by the DII program, this forum covers a wide range of topics, from the social background of this industry and overview of process technology, including wet processes, ALD, EUV light source development, etching, and mounting technology, as topics on the developments of elemental technologies for the three-dimensionalization of electron devices. Lectures from researchers and developers who are currently leading the fields will give a broad overview of the forefront of semiconductor device processes and provide an opportunity to start new collaboration. collaboration.

Organizer:
Hiroki Kondo, Associate professor, Ph. D, Center for low-temperature plasma sciences, Nagoya University.

Secretariat:
Center for low-temperature plasma sciences, Nagoya University
E-mail: contact@plasma.engg.nagoya-u.ac.jp
Tel: +81-52-788-6075